Technological Laboratory equipped with potentiostat / galvanostat

SiPor R&D Etching Setup ET&TE Etch and Technology GmbH.

Gill AC Potentiostat /Galvanostat/ZRA/FRA

etching

 

The Cylos 160 RIE – system of AURION is designed for several plasma processes:

•    Surface fine cleaning
•    Surface activation
•    RF-plasma cleaning/surface activation

rie

plasma

clio 3

 

 

Lithographic equipment MJB3 Mask Aligner

FL1 FL2

Cressington Carbon Coater/Sputter Coater

 sputter