| Gill AC Potentiostat /Galvanostat/ZRA/FRA | |
|---|---|
| Gill AC Potentiostat /Galvanostat setup is used for deposition of metals on the nanostructured semiconductor wafers for development of special architectures used in optoelectronic/photonic devices. |  |
| SiPor R&D Etching Setup ET&TE Etch and Technology GmbH | |
|---|---|
| SiPor setup is used for controlled etching of metals and semiconductors in order to obtain nanotubes, nanowires, or ultrathin membranes. It can be used in two, three or four electrodes configuration which allows for a very precise investigation of chemical reactions including bateries or electrodes for production of hydrogen. |  |